{"id":17577,"date":"2021-03-30T10:14:19","date_gmt":"2021-03-30T10:14:19","guid":{"rendered":"https:\/\/contrologic.co.th\/web\/products\/uncategorized\/vaisala-k%e2%80%91patents-semicon-refractometer-pr-23-ms\/"},"modified":"2021-03-30T10:21:17","modified_gmt":"2021-03-30T10:21:17","slug":"vaisala-k%e2%80%91patents-semicon-refractometer-pr-23-ms","status":"publish","type":"product","link":"https:\/\/contrologic.co.th\/web\/th\/products\/analytical-products\/liquid\/vaisala-k%e2%80%91patents-semicon-refractometer-pr-23-ms\/","title":{"rendered":"Vaisala K\u2011PATENTS\u00ae Semicon Refractometer PR-23-MS"},"content":{"rendered":"<p>for semiconductorLiquid chemical processes<br \/>\nA compact refractometer with an ultra-pure modified PTFE flow cell body for semiconductorLiquid chemical processes. Connected to the process by a \u00bc \u2014 1 inch pillar or flare fitting.<\/p>\n<p>Vaisala K-PATENTS\u00ae Semicon Refractometer PR-23-MS has a built-in, ultra-pure, modified PTFE flow cell designed to keep all metal and corroding parts from coming into contact with the processLiquid. All the wetted parts are made of ultra-pure, modified PTFE. The prism material is sapphire.<\/p>\n<p>The PR-23-MS is mounted directly in-line with a pillar or flare fitting. The compact design allows integration to a wet bench or to a cabinet, where the need for foot print area is very low.<\/p>\n<p>The dissolved solids concentration is determined by making an optical measurement of the solution\u2019s Refractive Index. The advantage of this principle is that the same instrument can be used to measure any chemical.<\/p>\n<p>The PR-23-MS provides a continuous 4-20 mA or digital measurement signal and immediate feedback to the control system, if the chemical is not within specifications. The PR-23-MS is physically a small device and easy to install in the bulk chemicals dispense, and in point of use chemical blending, spiking and monitoring applications.<\/p>\n<p>With Vaisala K-PATENTS\u00ae PR-23-MS you can:<br \/>\n&#8211; Prevent wrong chemicals from entering the fabrication process.<br \/>\n&#8211; Optimize etch process and increase the bath life of the etch solution (e.g. heated KOH).<br \/>\n&#8211; Increase wafer throughput typically by +25%, and reduce cleaning chemical consumption (e.g. SC-1 or EKC-265) in FEOL and BEOL cleaning.<br \/>\n&#8211; Achieve tight control of CMP slurries and better uniformity of the planarization process.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>for semiconductorLiquid chemical processes<br \/>\nA compact refractometer with an ultra-pure modified PTFE flow cell body for semiconductorLiquid chemical processes. Connected to the process by a \u00bc \u2014 1 inch pillar or flare fitting.<\/p>\n<p>Vaisala K-PATENTS\u00ae Semicon Refractometer PR-23-MS has a built-in, ultra-pure, modified PTFE flow cell designed to keep all metal and corroding parts from coming into contact with the processLiquid. All the wetted parts are made of ultra-pure, modified PTFE. The prism material is sapphire.<\/p>\n<p>The PR-23-MS is mounted directly in-line with a pillar or flare fitting. The compact design allows integration to a wet bench or to a cabinet, where the need for foot print area is very low.<\/p>\n<p>The dissolved solids concentration is determined by making an optical measurement of the solution\u2019s Refractive Index. The advantage of this principle is that the same instrument can be used to measure any chemical.<\/p>\n<p>The PR-23-MS provides a continuous 4-20 mA or digital measurement signal and immediate feedback to the control system, if the chemical is not within specifications. The PR-23-MS is physically a small device and easy to install in the bulk chemicals dispense, and in point of use chemical blending, spiking and monitoring applications.<\/p>\n<p>With Vaisala K-PATENTS\u00ae PR-23-MS you can:<br \/>\n&#8211; Prevent wrong chemicals from entering the fabrication process.<br \/>\n&#8211; Optimize etch process and increase the bath life of the etch solution (e.g. heated KOH).<br \/>\n&#8211; Increase wafer throughput typically by +25%, and reduce cleaning chemical consumption (e.g. SC-1 or EKC-265) in FEOL and BEOL cleaning.<br \/>\n&#8211; Achieve tight control of CMP slurries and better uniformity of the planarization process.<\/p>\n","protected":false},"featured_media":16735,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_acf_changed":false},"product_cat":[487],"product_tag":[],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.6 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Vaisala K\u2011PATENTS\u00ae Semicon Refractometer PR-23-MS - Contrologic<\/title>\n<meta name=\"description\" content=\"for semiconductorLiquid chemical processes A compact refractometer with an ultra-pure modified PTFE flow cell body for semiconductorLiquid chemical processes. 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With Vaisala K-PATENTS\u00ae PR-23-MS you can: - Prevent wrong chemicals from entering the fabrication process. - Optimize etch process and increase the bath life of the etch solution (e.g. heated KOH). - Increase wafer throughput typically by +25%, and reduce cleaning chemical consumption (e.g. SC-1 or EKC-265) in FEOL and BEOL cleaning. - Achieve tight control of CMP slurries and better uniformity of the planarization process.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/contrologic.co.th\/web\/th\/products\/analytical-products\/liquid\/vaisala-k\u2011patents-semicon-refractometer-pr-23-ms\/\" \/>\n<meta property=\"og:locale\" content=\"th_TH\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Vaisala K\u2011PATENTS\u00ae Semicon Refractometer PR-23-MS - Contrologic\" \/>\n<meta property=\"og:description\" content=\"for semiconductorLiquid chemical processes A compact refractometer with an ultra-pure modified PTFE flow cell body for semiconductorLiquid chemical processes. 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With Vaisala K-PATENTS\u00ae PR-23-MS you can: - Prevent wrong chemicals from entering the fabrication process. - Optimize etch process and increase the bath life of the etch solution (e.g. heated KOH). - Increase wafer throughput typically by +25%, and reduce cleaning chemical consumption (e.g. SC-1 or EKC-265) in FEOL and BEOL cleaning. - Achieve tight control of CMP slurries and better uniformity of the planarization process.","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/contrologic.co.th\/web\/th\/products\/analytical-products\/liquid\/vaisala-k\u2011patents-semicon-refractometer-pr-23-ms\/","og_locale":"th_TH","og_type":"article","og_title":"Vaisala K\u2011PATENTS\u00ae Semicon Refractometer PR-23-MS - Contrologic","og_description":"for semiconductorLiquid chemical processes A compact refractometer with an ultra-pure modified PTFE flow cell body for semiconductorLiquid chemical processes. 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